TARGET FOR SPUTTERING

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A target for sputtering, characterized in that it is a perovskite oxide represented by the chemical formula : Ra1-xAxBO 3-a [wherein Ra represents a rare earth element consisting of Y, Sc and a lanthanoid, A represents Ca, Mg, Ba or Sr, B represents a transition metal element such as Mn, Fe, Ni, Co, or Cr, and 0 < x <= 0.5], and has a relative density of 95 %% or more and a purity of 3N or higher. The above target comprising a perovskite oxide based ceramic material is improved in density and exhibits enhanced strength, and thus can prevent the occurrence of a fracture or a crack during the production or transfer process for the target or a sputtering operation, which results in the improvement in yield, and further can inhibit the generation of particles during the formation of a film, which results in the improvement of the quality of the film and in the reduction of the generation of failures. © KIPO & WIPO 2007