DIELECTRIC-COVERED ELECTRODE, AND THIN FILM DEPOSITION SYSTEM

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PROBLEM TO BE SOLVED : To provide a dielectric-covered electrode which has remarkably increased insulating properties, and can hold a discharge condition for a long period of time, and to provide a thin film deposition system provided with the dielectric-covered electrode. SOLUTION : The dielectric-covered electrode is obtained by thermally spraying particles consisting essentially of a first metal on the surface of an electrically conductive base material to apply a dielectric, and thereafter subjecting the surface layer of the dielectric to sealing treatment with a sealing agent consisting essentially of a second metal. The thin film deposition system 10 is provided with the dielectric-covered electrode. All the ion intensities of elements X belonging to boron, alkali metals and alkaline-earth metals detected from the surface of the dielectric after the sealing treatment to a prescribed depth according to dynamic SIMS (secondary ion mass spectrometry) measurement satisfy the ion intensities of the elements X/the ion intensity of the first metal ≤1.0×10-1, and also, at least one ion intensity in those of the elements X satisfies the inequality of 1.0×10-5≤the ion intensity of the element(s) X/the ion intensity of the first metal.