CLEANING GAS AND CLEANING METHOD

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PURPOSE : A cleaning gas and cleaning method are provided to increase the speed of etching reactions and increase the cleaning efficiency by a cleaning gas including fluorocarbon gas. CONSTITUTION : A cleaning gas includes a mixed gas containing a fluorocarbon gas, having at least one double bond per molecule, represented by the general formulaCvHxFyOz wherein v is an integer from 1 to 5, x is selected from 0 and an integer from 1 to 3, y is an integer from 1 to 12, and z is selected from 0 and 1; oxygen; and at least one selected from the group of nitrogen trifluoride, fluorine, nitrous oxide, nitrogen, and rare gases up to 10% by volume based on the total gas volume. © KIPO 2006