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POLISHING LIQUID, POLISHING LIQUID SET, ADDITIVE LIQUID, AND POLISHING METHOD

2025-06-17 20:262670下载
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Provided is a polishing liquid that comprises abrasive grains, a water-soluble compound that includes a trivalent rare-earth element, and a liquid medium, wherein the contained amount of the water-soluble compound is more than 0 mass% but less than 0.05 mass%.


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