Sputtering target

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To provide a sputtering target which allows suppression of contamination of a fluorine element being an impurity in the sputtering target, suppression of generation of an abnormal discharge due to fluorine when a thin film is formed by using the sputtering target, and formation of a thin film having a good orientation.SOLUTION : A sputtering target includes aluminum, and one or both of a rare earth element and a titanium group element. The content of fluorine is 100 ppm or less.SELECTED DRAWING : Figure 1