Sputtering Target

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The purpose of the present disclosure is to provide a sputtering target which suppresses a chlorine element, which is foreign matter, from being mixed into the sputtering target, wherein when a thin film is formed using the sputtering target, the occurrence of abnormal discharge due to chlorine can be suppressed, and a thin film having good orientation can be formed. The sputtering target of the present disclosure contains aluminum and further contains either or both of a rare earth element and a titanium group element, and the content of chlorine is 100 ppm or less.