With the base material, and a method of manufacturing these parts for a plasma etching device

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PROBLEM TO BE SOLVED : high plasma resistance, hardly peeled, excellent acid resistance, provide film having a surface of a base material with a high resistance value is a sprayed coating on the surface of the base material. SOLUTION : base material on the surface of the film base material having a coating, the coated film, and a thickness of 10-1000μm, fluoride (Ln) of a rare earth element oxide as a main component and containing, in the surface of the film, and the rare earth elements (Ln) as a main component, and a monoclinic structure, and particles of a specific diameter shaped part [α], and the rare earth elements consisting essentially of fluoride (Ln), having a prismatic structure, and a specific diameter of particle-like part [β], and a rare earth element (Ln) consisting essentially of amorphous dispersed in the matrix of the present, further, a surface of the film and observed using an optical microscope, white stainlike part is confirmed, in this part of the observation field stainlike occupying the area ratio is low, with the base material. Selected drawing : fig. 1