Photobase generator and a photosensitive resin composition containing the same

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PROBLEM TO BE SOLVED : To provide a photobase generator excellent in affinity to various solvents and a compound having an epoxy group used in combination therewith, and a photosensitive resin composition containing the same.SOLUTION : The photobase generator with high solubility to various solvents is represented by formula (1) {wherein R-Rare each a specific monovalent group; and Z is a partial structure represented by an unsubstituted or substituted amino group or cyclic amino group}. The photosensitive resin composition containing the same yields a large solubility contrast between exposed and unexposed parts (i.e. a high percentage of residual film), irrespective of the type of a polymer precursor, is alkali-developable and is photo-patternable.