Sputtering deposition method

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PROBLEM TO BE SOLVED : To provide a method for forming a film with a sputtering process, which can further improve the crystallinity of an LaBfilm, and also does not cause the peeling of the LaBfilm.SOLUTION : The LaBfilm having superior crystallinity can be obtained by an operation of sputtering an LaBtarget in such an atmosphere that 0.01-5 vol.% of nitrogen gas is added to argon, when the LaBfilm is formed on a substrate formed from tungsten or molybdenum and a material containing an oxide of a rare-earth element, with the sputtering process.