CONDUCTIVE THIN FILM

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PROBLEM TO BE SOLVED : To form, by a PVD process, a thin film which exhibits a blackish tone, when a coating thereof is applied to a substrate and has sufficient conductivity and hardness. SOLUTION : An aluminum nitride-based conductive thin film is formed by using a vapor deposition source composed of aluminum and manganese and an atmospheric gas including nitrogen mixed to a rare gas to coat a base material surface by a physical vapor deposition process. The thin film contains 2 at% or more and 25 at% or less of Mn and 10 at% or more and less than to 50 at% of N. When the respective contents (at% : atomic concentration) of the Mn and N are expressed as [Mn] and [N], 10/15×[Mn]+50/15<[N]<20/18×[Mn]+500/18 is satisfied. COPYRIGHT : (C)2014, JPO&INPIT