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PROBLEM TO BE SOLVED : To provide a film forming method that attains the formation of a good amorphous carbon film using a power supply for a bipolar PBII device at a low vacuum atmosphere, and to provide an amorphous carbon film that is obtained by the film forming method. SOLUTION : In the method for forming the amorphous carbon film using a power supply for a bipolar PBII device at a low vacuum atmosphere (at about 1, 000-30, 000 Pa), a power supply-side electrode 3 that is connected to a power supply 6 for the PBII device and an earth-side electrode 4 that faces the electrode 3 are arranged within a chamber 1, a base 2 is disposed on either of the power supply-side electrode 3 or the earth-side electrode 4, and an amorphous carbon film is formed on the surface of the base 2 by generating plasma of a rare gas and a hydrocarbon-containing gas between the base 2 and the electrode on which the base 2 is not disposed. COPYRIGHT : (C)2013, JPO&INPIT