METHOD FOR PRODUCING HIGH-PURITY INDIUM MONOCHLORIDE FROM RAW METALLIC INDIUM

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FIELD : processes for producing rare and trace elements, possibly production of high-purity semiconductor - kind indium. SUBSTANCE : method comprises steps of treating raw indium by two stages with ammonium chloride; at first stage treating at temperature of melt 190 - 210°C and at second stage - at temperature of melt 340 - 360°C. Slag is removed after first stage. EFFECT : effective removal of impurities such as aluminum, copper, nickel, silver, zinc, cadmium, tin, thallium, lead. 2 tbl, 1 ex