Separation system useful in a group of tools e.g. wafer processing tool, comprises a vacuum chamber

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A system of alkaline and alcalinoterreux metal deposit can include/understand a target of metal pulverization including/understanding of the coolant channels, a support of substrate to maintain a substrate directed towards the target and parallel to this one, and of the multiple sources of food arranged to apply energy to a plasma lit between the substrate and the target. The target can comprise a lid arranged to adapt above target material, the lid can include/understand a handle for a withdrawal and one replacement automated in the system of deposit, and a valve to reach volume between target material and the lid to pump, purge or pressurize gas in volume. The multiple sources of food can include/understand sources DC, DC pulsated, RF, bi-fréquence RF or other sources at multiple frequencies. Bi-fréquence sources RF can be arranged for the die-convolution of the control of the characteristics of plasma such as L autopolarisation, the density of plasma, ionic and electronic energy. The gas of pulverization can include a rare gas of an atomic mass lower than that of the metal target.