METHOD AND DEVICE FOR PLASMA TREATMENT

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PROBLEM TO BE SOLVED : To provide a method and device for plasma treatment by which the consumption of expensive krypton and xenon gases can be suppressed as much as possible and, at the same time, the damage given to an object to be treated can be reduced at the time of performing plasma treatment. SOLUTION : At the time of performing the plasma treatment on a substrate performed by using rare gases, two or more kinds of different rare gases are used. One of the rare gases is a cheap argon gas and the other gases are the krypton gas, xenon gas, or both the krypton and xenon gases having larger collision cross sections to electrons than the argon gas has. COPYRIGHT : (C)2006, JPO&NCIPI